期刊
Small
标题
Directed Self-Assembly of Polystyrene-Block-Polyhedral Oligomeric Silsesquioxane Monolayer by Nano-Trench for Nanopatterning
作者
Cheng-Hsun Tung, Feng Ye, Wei-Yi Li, The Anh Nguyen, Ming-Chang Lee, Tao Wen, Zi-Hao Guo, Stephen Z. D. Cheng, Rong-Ming Ho
摘要
Nanopatterning
In article number 2403581, Stephen Z. D. Cheng, Rong-Ming Ho, and co-workers demonstrate well-defined line nanopatterns with sub-10 nm feature size fabricated via directed self-assembly of POSS-based giant surfactant. This giant surfactant exhibits strong segregation strength, and fast self-assembly as well as excellent etching contrast, enabling reactive ion etching to create topographic nanopatterns. This bottom-up approach suggests a cost-effective method for next-generation lithography applications.
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