期刊
Advanced Electronic Materials
标题
A 10 nm Short Channel MoS2 Transistor without the Resolution Requirement of Photolithography
作者
Fan Wu,Jie Ren,Yi Yang,Zhaoyi Yan,He Tian,Guangyang Gou,Xuefeng Wang,Zijian Zhang,Xin Yang,Xing Wu,Tian-Ling Ren
摘要
Short-Cannel MoS2 Transistors
Yi Yang, He Tian, Xing Wu, Tian-Ling Ren, and colleagues demonstrate a photolithography resolution-independent method to realize 10 nm short-channel MoS2 transistors in article 2100543. By depositing the noble electrode partially on the self-oxidized aluminum electrode, the channel length is directly defined by the ≈10 nm thickness of oxidization layer, which can provide new opportunities for scaling down 2D materials-based transistors.
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